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FFS 2000 Major Functions
Removes Wafer residue gases(fume)
Controls temperature and humidity
Blocks the ambient air (alleviates sensitivity effect)
Easy set-up and maintenance
Monitors real-time machine environment
FFS Hybrid Major Functions
Equipped with the next-gen Fume Free System that controls the reactivity or the contaminants while transferring wafers in order to increase ‘yield’ and that can control the environment more effectively for micro-processes
A system applied with the mode which can cope with the wafers, targeted for 10nm-or-below process, in a variety of ways (various airflow control modes)
Fluid speed control and ambient air prevention through whirling airflow and deflected airflow